DCM-10 In-line refractometer

The  KxS DCM-10 is a cutting-edge optical refractometer engineered for real-time, in-line concentration monitoring of wet chemicals across nearly all wafer processing steps. From incoming chemical verification to wafer cleaning, chemical etching, and chemical mechanical planarization (CMP), the DCM-10 delivers unmatched precision and reliability.

Designed specifically for the demanding environments of semiconductor manufacturing, the DCM-10 ensures consistent chemical concentrations to optimize process performance, enhance yield, and reduce waste. Its compact footprint, true full-bore design, and dual-body construction make it ideal for seamless integration into fab tools and benches without compromising flow dynamics or measurement integrity.

Advanced functionality

The DCM-10 operates with a 24 VDC input power supply and offers flexible communication options, including analog (4-20 mA) and digital (Modbus TCP). When using the analog signal, the digital port serves as a service port for configuration and diagnostics via a computer web browser, external display, or mobile device. All port options can be utilized simultaneously, providing seamless integration and monitoring capabilities.

Precision and calibration

Factory calibrated for refractive index measurements, the DCM-10 displays temperature-compensated concentration units in % by weight or g/cm³. This ensures accurate and consistent monitoring of chemical concentrations, critical for maintaining process integrity and quality.

Key features

• True standalone operation: All measurement functions contained within the sensor, eliminating the need for an external transmitter.
• Extra small footprint design: The compact sensor and flow are ideal and fit into fab tools and benches.
• Excellent flow properties: True full bore; Optimized laminar flow pattern with minimal shear force on liquid (Patent pending).
• Easy installation: Connects with process line sizes of ¼, ⅜, ½, ¾, and 1 inch, using standard fittings.
• Dual-body construction: Optical components remain intact even if the flow cell is removed, ensuring consistent performance.
• Material compatibility: Materials designed to withstand the demanding conditions of semiconductor processing in the facilities and cleanroom environments.

Brochures

• KxS Semiconductor concentration monitor DCM-10

Manuals

• KxS Semiconductor concentration monitor DCM-10 manual

Certificates

• DNV Management System Certificate ISO 9001:2015
• DCM-10 ATEX certificate II 2/3G Ex ec mc IIC T4 Gb/Gc
• DCM-10 IECEx certiicate II 2/3G Ex ec mc IIC T4 Gb/Gc

Applications

• KxS Application Insights Semiconductor CMP slurry Insights
• Slurry Delivery Systems Defining Incoming CMP Slurry Density and Achieving Target Process Conctration Driven by Inline Metrology Unify CMP Engineers – ICPT_2022
• Inline Refractive Index-based Slurry Density Monitoring to Optimize Raw CMP Slurry Container Dispersion – ICPT_2023